What process gasses are used with an HF system?

The process gasses used in HFIC systems are Argon, Hydrogen, Hydrogen Fluoride, Anhydrous Ammonia and on some systems Nitrogen.
– Argon – used to purge the reactor chamber before and after Hydrogen use – customer supplies, liquid source preferred.
– Hydrogen – the carrier gas for the process – customer supplies, liquid source preferred.
– Hydrogen Fluoride – reactant gas for the process – customer supplies, 2 bottles housed in special gas cabinet on HFIC system.
– Anhydrous Ammonia – neutralizing agent for HF gas – customer supplies, 2 bottles mounted on HFIC system.
– Nitrogen – sometimes used for cold reactor purging and scrubber system purging – customer supplies, liquid source or gas bottles.